Reddit Is Taking Over Google An anonymous reader quotes a report from Business Insider: If you think you've been seeing an awful lot more Reddit results lately when you search on Google, you're not imagining things. The internet is in upheaval, and for website owners the rules of "winning" Google Search have never been murkier. Google's generative AI search engine is coming from one direction. It's creeping closer to mainstream deployment and bringing an existential crisis for SEOs and website makers everywhere. Coming fro… Meta Is Already Training a More Powerful Successor to Llama 3 The open source Llama 3 AI model released by Meta today is just the start, according to the company’s chief AI scientist, Yann LeCun. He said a new, much larger version is in the works. |
I tested Samsung's flagship laptop and it gave my MacBook Pro a run for its money The Samsung Galaxy Book 4 Ultra impresses with one of the best displays on the market and exceptional battery life. How Microsoft’s Git fork scales for massive monorepos Building applications at scale is nothing compared to building an operating system like Windows, especially when it comes to source code control . How do you manage the repository (or repositories) for such a software behemoth, with thousands of developers and testers, and with a complex build pipeline that’s continuously delivering fresh code? Microsoft’s history with internal source control systems is convoluted. You might think it used the now discontinued Visual SourceSafe, but that was mos… Meta Is Already Training a More Powerful Successor to Llama 3 The open source Llama 3 AI model released by Meta today is just the start, according to the company’s chief AI scientist, Yann LeCun. He said a new, much larger version is in the works. ASML Patterns First Wafer Using High-NA EUV Tool, Ships Second High-NA Scanner This week ASML is making two very important announcements related to their progress with high numerical aperature extreme ultraviolet lithography (High-NA EUV). First up, the company's High-NA EUV prototype system at its fab in Veldhoven, the Netherlands, has printed the first 10nm patterns, which is a major milestone for ASML and their next-gen tools. Second, the company has also revealed that i… |
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